Bergische Universität Wuppertal - ipaMS
About the company
The “institute for pure and applied mass spectrometry” (ipaMS) at the University of Wuppertal was founded in 2011 by eight local groups from science and engineering fields in order to advance research and teaching related to mass spectrometry. The name expresses the pursued integral picture of mass spectrometers, bringing together applicational and fundamental aspects. The ipaMS recalls and carries on the MS pioneers works regarding profound research, physically and chemically sound developments, applications and data interpretation. In terms of the universities objectives "research and teaching" we provide a platform for other universities, research groups and external partners in the fundamental understanding, experience exchange, development and application of modern mass spectrometry and allied ion analytical methods.
Project contribution
The institute for pure and applied mass spectrometry (ipaMS), together with the Department of Physical and Theoretical Chemistry at the University of Wuppertal, analyses EUV‑induced plasmas, focusing on the native ions formed within them. Leveraging our expertise in custom mass‑spectrometry‑based metrology, we develop and operate high‑end research‑grade instruments that can be integrated into EUV lithography environments. By combining experimental plasma‑chemistry work with advanced theoretical modelling, we generate spatially and temporally resolved, kinetic‑energy‑resolved mass‑spectrometric data with high mass resolution, revealing the dynamics of plasma constituents and their interactions with surrounding surfaces. These insights deepen the understanding of EUV plasma chemistry and aim to extend the lifetime of optical EUV‑lithography elements. Results obtained in our laboratories and during campaigns at 14 AMI partner sites serve as precise input parameters for kinetic models under well‑defined plasma boundary conditions. The outcome is novel metrology for both scanner monitoring and fundamental plasma research, contributing to more reliable, cost‑effective EUV lithography.